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ToshibaCorp. and NECElectronics Corp. will collaborate on the development of a system LSI processtechnology for the 32nmgeneration.

The two companies have been working together on 45nmprocess technology since February 2006 at Toshiba's Advanced Microelectronics Center in Yokohama. SonyCorp. was part of these development efforts, but was reported to have left the group early this year.

Under the new agreement, Toshiba and NEC will extend the scope of their collaboration at the site to 32nm with the aim of accelerating development and sharing development costs.

The two companies will discuss the development of derivative and differentiated process technologies separately. Additionally, Toshiba and NEC Electronics continue to discuss joint manufacturing, and expect to reach a decision concerning this in 2008.